Editor-in-Chief and Editors
Reha Uzsoy - Clifton A. Anderson Distinguished Professor
T-SM Associate Editors
Jeanne Bickford - Yield Modeling and Analysis and Factory Modeling
Hunter Brugge - Yield Enhancement
Samsung Austin Semiconductor
Alain Diebold - Metrology
Mircea Dusa - Lithography and Advanced Processing
Mircea V. Dusa is an ASML Fellow and a founding member of ASML’s Technology Development Center. He has over 40 years of experience in semiconductor industry encompassing manufacturing, development and research, starting from mask making to stepper and metrology engineering. Currently, he works on exploratory imaging solutions for advanced lithography tools seeking integration of exposure tools functionality to non-lithography tool components, from layout design, to photomask, patterning processes and associated metrology and control techniques. Prior to ASML, he was in various engineering positions at National Semiconductor/Fairchild Research Center, SEEQ Technology, ST Microelectronics, Zygo Corporation. He has over 200 publications and holds two dozen US patents in lithography and metrology sciences on topics ranging from DTCO, imaging, overlay and CD control and patterning processes. He is an active member of SPIE, where he chaired the Advanced Lithography Symposium between 2013-2016, Optical Microlithography Conference between 2008-2011 and International Working Group for Photolithography. From 2008 to today, Mircea is teaching SPIE’s special course on Multi Patterning Principles and Applications. He is a member of IEEE and a SPIE Fellow. Dr. Dusa graduated with a BS in Electrical Engineering, MS in Solid State Physics from University of Bucharest in Romania and holds a Ph.D. degree in Applied Optics from the same university.
John W. Fowler - Factory Modeling and Control
Dept. of Supply Chain Management
Ruey-Shan Andy Guo - Advanced Process Control
Research Areas: Process Control, Quality Engineering, Supply Chain Management
Professional Memberships: IEEE/EDS
Biography: Prof. Guo received his Ph.D. degree in Mechanical Engineering with a major in manufacturing and a minor in solid state physics from Massachusetts Institute of Technology in 1991. From 1991 to 1995, he was a research engineer at National Semiconductor, Santa Clara, CA, USA. He also obtained his MBA degree from San Jose State University in 1994.
Since 1995, he has been with National Taiwan University. He is currently the Dean of College of Management as well as the Distinguished Professor in the Department of Business Administration. During his current position, he has been a principal investigator or co-PI to many industry and institution funded projects in the areas of quality management, technology management, and supply chain management.
Prof. Guo teaches undergraduate and graduate courses in operations management, entrepreneurship and innovation management, and supply chain management. He won Excellent Teaching Awards from National Taiwan University several times and the best journal paper awards from the Chinese Management Association in 1999 and 2009. He is an IEEE member and is currently the Associate Editor of IEEE Transactions on Semiconductor Manufacturing.
Soichi Inoue - Photolithography
Lithography Process Technology Department,
Biography: Soichi Inoue joined Toshiba Corporation in 1987, and has been engaged in the research and development of many lithography technologies for over 25 years. He is currently the General Manager at EUVL Infrastructure Development Center, Inc. (EIDEC) on assignment from Toshiba in April 2011. He returned to Toshiba and was promoted to the Senior Manager of Lithography Process Technology Department in Apr. 2015.
His first research in Toshiba was the development of soft X-ray microscopy to investigate the key technologies on the image formation with mirror optics in the vacuum environment. Then he has been engaged in the development of optical lithography. His specific area of expertizes is overall lithography technologies including lithography integration, scanner technology, advanced mask technology, resolution enhancement technology, process monitor technology, OPC, DFM, lithography modeling and numerical computing of lithographic imaging. His current research interest is overall Next Generation Lithography including EUV lithography, Nano-inprint, DSA technologies. He has published more than 100 papers in technical journals and conferences, and has been awarded 90 patents. He won the Semi Technology Symposium Award for double patterning technology in 2008.
He received his B.S. in Mechanical Engineering Science, and M.S. in Information Processing from Tokyo Institute of Technology in 1985 and 1987, respectively. He enrolled in a doctoral program at Tokyo Institute of Technology in 2010 and received his doctoral degree in Sept., 2011.
Dongchan Kim - Advanced Processing
Biography: Dongchan Kim received the B.S. degree from Seoul National University, Seoul, South Korea, the M.S. and Ph.D. degrees majoring in physical chemistry from KAIST(Korea Advanced Institute of Science and Technology), Taejon, South Korea. After doing the post doctoral study in department of chemistry at University of North Carolina at Chapel Hill, NC, USA, he joined Samsung Electronics as a senior process engineer in 2000. Since then, he has spent his career working in various semiconductor fields - chemical vapor deposition, integration management and yield control, dry etching, and equipment development, etc. From 2006 to 2007, he was a Samsung assignee to IMEC, Leuven, Belgium. He continued the career as a Principal Engineer at Samsung Semiconductor R&D Center.(2007-2016) He is currently a Senior Director doing etch equipment and process developments at Advanced Micro-Fabrication Equipment Inc.(AMEC) (2016-) He has about 25ea of publications and presentations. He was a keynote speaker for several symposiums such as APCPST 2012, DPS 2013, and ICMAP 2014. He also has about 50 patents worldwide as the 1st author or co-author.
Bo Lojek - Equipment & Process Technology
Lars Mönch - Factory Modeling and Automation
Mahadeva Iyer Natarajan - Yield Modeling and Analysis and Yield Enhancement
Nital S. Patel - Advanced Process Control
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