Editor-in-Chief and Editors
Reha Uzsoy - TSM Editor-in-Chief
Reha Uzsoy is Clifton A. Anderson Distinguished Professor in the Edward P. Fitts Department of Industrial and Systems Engineering at North Carolina State University. He holds BS degrees in Industrial Engineering and Mathematics and an MS in Industrial Engineering from Bogazici University, Istanbul, Turkey. He received his Ph.D in Industrial and Systems Engineering in 1990 from the University of
Florida, and held faculty positions in Industrial Engineering at Purdue University prior to joining North Carolina State University in 2007. His teaching and research interests are in production planning and supply chain management. Before coming to the US he worked as a production engineer with Arcelik AS, a major appliance manufacturer in Istanbul, Turkey. He has also been a visiting researcher at Intel
Corporation and IC Delco. He was named a Fellow of the Institute of Industrial Engineers in 2005, Outstanding Young Industrial Engineer in Education in 1997, and has received awards for both undergraduate and graduate teaching. He is the author of more than 120 refereed journal papers and book chapters, one monograph and three edited books.
T-SM Associate Editors
Jeanne Bickford - Yield Modeling and Analysis and Factory Modeling
Dr. Jeanne Bickford has had a long and wide-ranging career first as a member of IBM’s technical Staff in various scientific and managerial roles, and most recently as a Distinguished Member of the Technical Staff at Globalfoundries. Her experience spans the range of manufacturing, product design, new product introduction and device design. She has authored/co-authored 30 conference/journal papers in the area of design for manufacturing and has 87 issued US patents, one issued China patent, and one issued Japan patent. Dr. Bickford has also served as a guest associate editor for these Transactions for the last 2 years, managing papers associated with the annual ASMC Conference. Her extensive experience will allow her to contribute in the areas of Yield Modeling and Analysis and Factory Modeling.
Alain Diebold - Metrology
Alain Diebold is Interim Dean of the College of Nanoscale Sciences which includes the Nanoscience and Nanobioscience Constellations at SUNY Polytechnic Institute. The College also leads the Institute for Nanoelectronics Discovery and Exploration (INDEX) which is one of three Centers funded by the Semiconductor Research Corporation. Alain holds a PhD in Chemistry from Purdue University. He is a SPIE Fellow and an AVS Fellow. Alain was hired as an Empire Innovation Professor of Nanoscale Science and Executive Director Center for Nanoscale Metrology. Prior to joining academia, he was a senior chemist at Allied Signal before joining SEMATECH where SEMATECH Senior Fellow. For many years, he co-lead the Metrology Roadmap Technical Working Group for the International Technology Roadmap for Semiconductors which he started. This group wrote the semiconductor industry’s roadmap for Metrology and Characterization for more than fifteen years.
Mircea Dusa - Advanced Processing
Mircea V. Dusa is an ASML Fellow and a founding member of ASML’s Technology Development Center. He has over 40 years of experience in semiconductor industry encompassing manufacturing, development and research, starting from mask making to stepper and metrology engineering. Currently, he works on exploratory imaging solutions for advanced lithography tools seeking integration of exposure tools functionality to non-lithography tool components, from layout design, to photomask, patterning processes and associated metrology and control techniques. Prior to ASML, he was in various engineering positions at National Semiconductor/Fairchild Research Center, SEEQ Technology, ST Microelectronics, Zygo Corporation. He has over 200 publications and holds two dozen US patents in lithography and metrology sciences on topics ranging from DTCO, imaging, overlay and CD control and patterning processes. He is an active member of SPIE, where he chaired the Advanced Lithography Symposium between 2013-2016, Optical Microlithography Conference between 2008-2011 and International Working Group for Photolithography. From 2008 to today, Mircea is teaching SPIE’s special course on Multi Patterning Principles and Applications. He is a member of IEEE and a SPIE Fellow. Dr. Dusa graduated with a BS in Electrical Engineering, MS in Solid State Physics from University of Bucharest in Romania and holds a Ph.D. degree in Applied Optics from the same university.
John W. Fowler - Factory Modeling and Control
Dept. of Supply Chain Management
JOHN W. FOWLER is the Motorola Professor of Supply Chain Management and recently served as Chair of the Supply Chain Management department in the W.P. Carey School of Business at Arizona State University. His research interests include discrete event simulation, deterministic scheduling, multi-criteria decision making, and applied operations research with applications in semiconductor manufacturing and healthcare. He has published over 120 journal articles and over 100 conference papers. He was the Program Chair for the 2002 and 2008 Industrial Engineering Research Conferences and the 2008 Winter Simulation Conference (WSC). He was the founding Editor-in-Chief of IIE Transactions on Healthcare Systems Engineering and currently serves as a Healthcare Operations Management Departmental Editor. He is also an Editor of the Journal of Simulation and Associate Editor of IEEE Transactions on Semiconductor Manufacturing and the Journal of Scheduling. He is a Fellow of the Institute of Industrial and Systems Engineers (IISE) and recently served as the IIE Vice President for Continuing Education, is a former INFORMS Vice President, and currently serves on the WSC Board of Directors. His email address is <email@example.com>.
Ruey-Shan Andy Guo - Advanced Process Control
Research Areas: Process Control, Quality Engineering, Supply Chain Management
Professional Memberships: IEEE/EDS
Biography: Prof. Guo received his Ph.D. degree in Mechanical Engineering with a major in manufacturing and a minor in solid state physics from Massachusetts Institute of Technology in 1991. From 1991 to 1995, he was a research engineer at National Semiconductor, Santa Clara, CA, USA. He also obtained his MBA degree from San Jose State University in 1994.
Since 1995, he has been with National Taiwan University. He is currently the Dean of College of Management as well as the Distinguished Professor in the Department of Business Administration. During his current position, he has been a principal investigator or co-PI to many industry and institution funded projects in the areas of quality management, technology management, and supply chain management.
Prof. Guo teaches undergraduate and graduate courses in operations management, entrepreneurship and innovation management, and supply chain management. He won Excellent Teaching Awards from National Taiwan University several times and the best journal paper awards from the Chinese Management Association in 1999 and 2009. He is an IEEE member and is currently the Associate Editor of IEEE Transactions on Semiconductor Manufacturing.
Dr. Gloria E. Hoefler holds Ph.D. M.S. and B.S. degrees in Electrical Engineering from the University of Illinois at Urbana-Champaign. She worked at 3M’s Corporate Research Laboratories, HP’s Optoelectronic Division, LumiLeds Lighting, Agilent Technologies, Corning and Infinera in research and development as well as high-volume manufacturing of semiconductor materials, optoelectronic devices and photonic integration platforms. Dr. Hoeffler has co-authored over 80 peer-reviewed and invited papers and holds multiple patents in the area of optoelectronic devices. She is an SPIE Fellow and an IEEE Sr. member.
Currently, she is Director of Advanced Development at Infinera working on photonic integrated circuits and photonic integration platforms.
Soichi Inoue - Photolithography
Lithography Process Technology Department,
Biography: Soichi Inoue joined Toshiba Corporation in 1987, and has been engaged in the research and development of many lithography technologies for over 25 years. He is currently the General Manager at EUVL Infrastructure Development Center, Inc. (EIDEC) on assignment from Toshiba in April 2011. He returned to Toshiba and was promoted to the Senior Manager of Lithography Process Technology Department in Apr. 2015.
His first research in Toshiba was the development of soft X-ray microscopy to investigate the key technologies on the image formation with mirror optics in the vacuum environment. Then he has been engaged in the development of optical lithography. His specific area of expertizes is overall lithography technologies including lithography integration, scanner technology, advanced mask technology, resolution enhancement technology, process monitor technology, OPC, DFM, lithography modeling and numerical computing of lithographic imaging. His current research interest is overall Next Generation Lithography including EUV lithography, Nano-inprint, DSA technologies. He has published more than 100 papers in technical journals and conferences, and has been awarded 90 patents. He won the Semi Technology Symposium Award for double patterning technology in 2008.
He received his B.S. in Mechanical Engineering Science, and M.S. in Information Processing from Tokyo Institute of Technology in 1985 and 1987, respectively. He enrolled in a doctoral program at Tokyo Institute of Technology in 2010 and received his doctoral degree in Sept., 2011.
Dongchan Kim - Advanced Processing
Biography: Dongchan Kim received the B.S. degree from Seoul National University, Seoul, South Korea, the M.S. and Ph.D. degrees majoring in physical chemistry from KAIST(Korea Advanced Institute of Science and Technology), Taejon, South Korea. After doing the post doctoral study in department of chemistry at University of North Carolina at Chapel Hill, NC, USA, he joined Samsung Electronics as a senior process engineer in 2000. Since then, he has spent his career working in various semiconductor fields - chemical vapor deposition, integration management and yield control, dry etching, and equipment development, etc. From 2006 to 2007, he was a Samsung assignee to IMEC, Leuven, Belgium. He continued the career as a Principal Engineer at Samsung Semiconductor R&D Center.(2007-2016) He is currently a Senior Director doing etch equipment and process developments at Advanced Micro-Fabrication Equipment Inc.(AMEC) (2016-) He has about 25ea of publications and presentations. He was a keynote speaker for several symposiums such as APCPST 2012, DPS 2013, and ICMAP 2014. He also has about 50 patents worldwide as the 1st author or co-author.
Mahadeva Iyer Natarajan - Yield Modeling and Analysis and Yield Enhancement
Dr. Mahadeva Iyer Natarajan is currently Director of Reliability Engineering and Global Reliability Lead at Globalfoundries, and has held positions at Chartered Semiconductor/Globalfoundries Singapore and several other firms, as well as serving as a member of the technical staff at the Institute of Microelectronics in Singapore. His experience and interests span the range of supporting product reliability issues across product design, manufacturing and customer support. He is the author of more than 90 technical publications and holds 28 patents with several others pending, and will support us in the areas of Yield Modeling and Analysis and Yield Enhancement.
Nital S. Patel - Advanced Process Control
Nital S. Patel (S’91–M’96–SM’01) received the B.Tech. degree from the Indian Institute of Technology, Kanpur, India, and the M.S. and Ph.D. degrees from the University of Maryland, College Park, all in electrical engineering. He is currently with the Assembly and Test Technology Development group, Intel Corporation, Chandler, AZ, where he is a Principal Engineer responsible for innovations in data analytics and manufacturing systems. Previously, he was a Senior Member of Technical Staff focusing on process control at Texas Instruments, Inc. He holds eleven patents in the area of semiconductor process control and is the author/co-author of over fifty publications.
Gian Antonio Susto - Factory & Process Modeling
Gian Antonio Susto (S'11-M'16) received the M.S. degree (cum laude) in control systems engineering and the Ph.D. in Information Engineering from the University of Padova, Padova, Italy, in 2009 and 2013. He is currently Assistant Professor at University of Padova. He is also a co-founder at Statwolf Ltd. He has been a visiting student at the University of California, San Diego (2008-09), and at National University of Ireland Maynooth (NUIM) (2012), an Intern Researcher at Infineon Technologies Austria AG, Villach, Austria (2011) and post-doctoral associate at NUIM (2013). During his career, his awards include the IEEE-CASE Best Student Conference Paper Award (2011), IEEE/SEMI-ASMC Best Student Paper Award (2012) and IEEE-MSC Best Student Paper Award (2012). His research interests include manufacturing data analytics, machine learning, gesture recognition and natural language processing. He is the author of more than 40 technical publications, and his knowledge of data science and analytics will significantly enhance our Factory Modeling area.
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